Mantis MATS30 RF Atom Source

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MANTIS
UHV Deposition Components & Systems


MANTIS Deposition is dedicated to the manufacture of high-quality deposition components for cutting-edge applications.  Our product offerings include; nanocluster deposition sources and systems, RF atom and RF ion sources, e-beam evaporators, k-cells and thermal gas crackers. 

MANTIS sources are technologically advanced to ensure the highest reliability, ease-of-use and offer the best performance/cost ratio in the industry.  MANTIS k-cells, e-beam evaporators, thermal gas crackers and the smaller ion and atom sources are well suited to small scale research studies in MBE, surface science or PVD.  For production, the MANTIS 175mm diameter RF atom source or 130mm diameter RF ion source can process substrates up to 8" and beyond. 

Our UHV deposition systems are designed to be extremely versatile with many retrofittable options to meet the demands of future requirements.  The deposition of nanoclusters is a leading edge method of producing film characteristics that are unachievable through conventional thin film coating methods.  MANTIS takes your research and development to a new level. 


Mantis will be exhibiting at the APS Conference in Montreal, March 22-24th 2004.
See us at booth #203.





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